Graphite nanostructures fabricated by a simple plasma etching onto a graphite substrate provide an intense emission source of electrons. This cathode does not have the adherence problem commonly seen in carbon deposited emission layera such as carbon nanotubes and graphite nanofibers, thus making it promising for applications in high power devices. The performance of this cold cathode was demonstrated by obtaining high-intensity pulse x-ray generation. High-speed x-ray radiography images of dynamical processes of the order of 10 μs were also shown by using the pulse x-ray source.
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Matsumoto et al. (2005) studied this question.
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