Scattering of light from chemically etched InP surfaces is studied in the present paper. A model is developed to describe the randomly rough surfaces produced by chemical etching and this model is used in a numerical simulation using the Kirchhoff approximation to calculate the scattered intensity distribution from the surfaces. Comparisons between the numerical results and experimental measurements for an incident wavelength of 633 nm show good agreement. Numerical simulation results are presented to show the variation of the scattered intensity distribution for surfaces with different times of chemical etching. These results are useful for characterization or control of this type of surface.
No takes yet. Share an insight, caveat, or question.
Rovira-Laparra et al. (2007) studied this question.
Synapse has enriched 5 related papers. Consider them for comparative context: