Germanium nano-cluster films as humidity and hydrogen sensors

Films of germanium nano-clusters of 30 nm diameter were fabricated in a high-vacuum deposition apparatus utilizing an inert-gas-aggregation source. The germanium films readily formed an oxide layer in high vacuum along with a corresponding resistance increase, a process that accelerated when films were exposed to dry air. A decrease in resistance was observed when films were exposed to ambient air, and this was attributed to water vapour adsorbing on the surface. The effects of film-thickness were investigated. A reversible change in resistance of 2 orders of magnitude was observed for 99% humidity, with a response time of tens of minutes. It is proposed that the resistance-decrease occurs because water vapour creates surface defects which act as donors causing the electron concentration in the n-type film to increase. The films were also sensitive to hydrogen concentrations above 1% in dry air, with up to a factor of 25 decrease in resistance observed for 5% hydrogen concentration at room temperature. Unexpectedly, the sensitivity to hydrogen was only observed at temperatures below 100 °C, suggesting that surface moisture is necessary for films to show sensitivity to hydrogen.