The interference between boundary and bulk scattering processes is analysed for ultrathin films with random rough walls. The effective collision and transport relaxation times for scattering by random bulk and surface inhomogeneities are calculated, when possible analytically, in quantum size effect conditions. The transport and localization results are expressed via the bulk transport parameters and statistical characteristics of the surface corrugation. The diagrammatic calculation includes second-order effects for boundary scattering and full summation for bulk processes. The interference contribution is large in systems with robust bulk scattering and can be comparable to, or even exceed, the pure wall contribution to the transport coefficients.
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Meyerovich et al. (2000) studied this question.
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