Cu‐metal‐doped glass films having a Cu:Si atomic ratio of 0.05 ± 0.002 were successfully prepared by a sol‐gel method using a dipping technique. The appearance of surface plasmon of Cu metal at about 570 nm was observed after heat treatment at or above 700°C. The third‐order nonlinear susceptibility (x 3 ) was as high as 5.0 × 10 –8 esu at 570 nm.
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Kundu et al. (1994) studied this question.
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