The oxidation behavior of the silicon yttrium oxynitride Y 10 Si 7 O 23 N 4 , so‐called H‐phase, in the temperature range 700–1400°C has been investigated. A nitrogen retention phenomenon in the oxidation product Y 4.67 (SiO 4 ) 3 O (O‐apatite) is discussed. The H‐phase is one of the four quaternary compounds identified in hot‐pressed Si 3 N 4 materials fabricated within the Si 3 N 4 –SiO 2 –Y 2 O 3 pseudoternary system.
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Veyret et al. (1992) studied this question.
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