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A persistent silyl radical, tris(t-butyldimethylsilyl)silyl radical, (t-BuMe2Si)3Si· (1), was produced by two new methods in addition to a conventional hydrogen abstraction from the corresponding hydrosilane: one-electron oxidation of (t-BuMe2Si)3SiNa (2) by NO+BF4− and one-electron reduction of (t-BuMe2Si)3SiBr (3) by sodium.
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Kira et al. (1998) studied this question.
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