Patterning of Epitaxial Organic Films by Selective Epitaxial Growth

A new method of patterning crystalline organic molecular films is proposed and demonstrated. It utilizes a selective growth, or the difference in the sticking coefficient of an organic material on various inorganic substrates in a certain temperature range. The object structure is first patterned on a single-crystalline substrate with an epitaxial film of a different material grown by molecular beam epitaxy (MBE) through a mask, and then a beam of the organic molecule is irradiated uniformly after removing the mask.