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January 1, 1985Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

New, deep UV resist (LMR) for lift-off technique

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Authors

YYYoshio YamashitaSaga UniversityRKRyuzi KawazuOki Electric Industry (Japan)KKKazutami KawamuraOki Electric Industry (Japan)

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Cite This Study

Yamashita et al. (1985) studied this question.

synapsesocial.com/papers/6a978d8bcb7f2a2edc74b97ahttps://doi.org/10.1116/1.583253
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