Photoluminescence (PL) and electroluminescence (EL) measurements are performed on Si∕SiO2 multiple quantum wells fabricated by using a combination of remote plasma enhanced chemical vapor deposition (RPECVD) and rapid thermal annealing (RTA). A significant enhancement of light emission is observed from nanocrystalline Si wells embedded in a SiO2 matrix. The enhancement depends critically on additional annealing processes carried out after the RPECVD deposition.
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Rölver et al. (2005) studied this question.