Transparent Si/SiOx nanocomposite films, spontaneously adsorbed on glass or quartz substrates from their colloidal suspensions via a sonication-assisted oxidation process, are presently reported. Individual nanosilicon particles (ca. 20 nm) appear to cover a significant part of the substrate along with agglomerates on the order of 50−80 nm in thickness. Kinetic studies indicate a rapid initial adsorption that slows down significantly after 3 h.
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Papadimitrakopoulos et al. (1999) studied this question.
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