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June 1, 1984Japanese Journal of Applied PhysicsOpen Access

Raman Microprobe Study on Relaxation of Residual Stresses in Patterned Silicon-on-Sapphire

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Authors

KYKen’ichi YamazakiKyoto UniversityRURicardo Katsumi UotaniKNKatsumi Nambu

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Cite This Study

Yamazaki et al. (1984) studied this question.

synapsesocial.com/papers/6a97a9190fc5fb4479faccdahttps://doi.org/10.1143/jjap.23.l403
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Raman Scattering Characterization of Residual Stresses in Silicon-on-Sapphire1984 · 32 citations
  2. 2Anomalous Residual-Stress in Pulsed-Laser-Annealed Silicon-on-Sapphire Revealed by Raman Scattering1981 · 11 citations
  3. 3Microstrain in laser-crystallized silicon islands on fused silica1982 · 63 citations
  4. 4Elastoresistance of n-type silicon on sapphire1974 · 41 citations
  5. 5Relief of Residual Strain in Silicon-on-Sapphire by Heat-Assisted Pulsed-Laser Annealing1981 · 5 citations