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Fundamental Investigation of Chemical Mechanical Polishing of GaAs in Silica Dispersions: Material Removal and Arsenic Trihydride Formation Pathways, Matovu, J. B., Ong, P., Leunissen, L. H. A., Krishnan, Sitaraman, Babu, S. V.
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Matovu et al. (2013) studied this question.
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