November 30, 1999Journal of Micromechanics and Microengineering

A new release process for polysilicon surface micromachining using sacrificial polysilicon anchor and photolithography after sacrificial etching

View Full Paper

Ask AI

Bookmark

Abstract

A new release process for polysilicon surface micromachining using sacrificial polysilicon anchor and photolithography after sacrificial etching, Zhixiong Xiao, Yilong Hao, Ting Li, Guobing Zhang, Shimei Liu, Guoying Wu

Discussion

No takes yet. Share an insight, caveat, or question.

Cite This Study

Xiao et al. (1999) studied this question.

synapsesocial.com/papers/6a9802ef0fc5fb4479fae138 https://doi.org/10.1088/0960-1317/9/4/303

View Full Paper

Ask AI

Bookmark

A new release process for polysilicon surface micromachining using sacrificial polysilicon anchor and photolithography after sacrificial etching

Abstract

Discussion

Cite This Study

A new release process for polysilicon surface micromachining using sacrificial polysilicon anchor and photolithography after sacrificial etching

Abstract

Discussion

Cite This Study

Keep reading

Keep reading