We propose a new lithography technique using the optical near field. This technique makes use of a super-resolution near-field structure (Super-RENS) which was first proposed by us for high-density data storage. Using this structure, we have fabricated narrow grooves in a photoresist film spin-coated on a Super-RENS disk at a constant linear velocity of 6 m/s and about 400 rotations with a mercury lamp (λ=365 nm) for exposing the photoresist film and a semiconductor laser (λ=635 nm) for generating a small optical aperture. By adjusting the laser power, narrow grooves with a full-width at half-maximum (FWHM) of less than 200 nm could be fabricated in the photoresist film. Moreover, a fabrication speed 104 or 105 times greater than that with the conventional techniques using a near-field scanning optical microscope was achieved.
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Kuwahara et al. (1999) studied this question.