High-resolution photoemission study of Co/Si(111) interface formation

We have examined the formation of the Co/Si(111) interface at room temperature using high-resolution core-level photoemission spectroscopy. Two chemically shifted Si 2p core-level components have been identified. The evolution of these components with Co coverage makes it possible to model the development of this interface. Heterogeneous CoSi₂-like cluster formation is observed for nominal Co coverages of less than {}4 A{}. Continued reaction to form CoSi₂ becomes diffusion limited when the clusters coalesce, and a solid solution forms with Si atoms in a Co matrix. For Co coverages of more than 8--10 A{}, the interfacial region is buried by a metallic Co film.