We demonstrate highly manufacturable nonpolar ( m -plane) InGaN/GaN laser diodes without any Al-containing waveguide cladding layers. These devices utilize thick InGaN quantum wells to generate transverse optical mode confinement and can be grown and fabricated in a manner analogous to InGaN/GaN light emitting diodes. Pulsed lasing operation was demonstrated, with threshold voltages and current densities of 6.7 V and 3.7 kA/cm 2 , respectively.
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Feezell et al. (2007) studied this question.
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