Single‐Source Routes to Cobalt Sulfide and Manganese Sulfide Thin Films

The air stable compounds [M(S2CNMenHex)3] (M = Co or Mn) have been shown to be effective single‐source precursors for the deposition of metal chalcogenides by aerosol‐assisted (AA) CVD. As‐deposited cobalt sulfide thin films have various compositions depending on different growth temperatures, as indicated by XRPD, whereas only a single phase of manganese sulfide has been deposited at various growth temperatures. The films are further characterized by SEM/EDAX and TEM.