Fabrication of metal-oxide semiconductor field-effect transistors (MOSFETs) in silicon using processes in which MIMIC (micromolding in capillaries—a soft lithographic technique) rather than photolithography is used is described. The Figure shows a micrograph of an array of p-MOSFETs obtained from this process. This demonstrates that MIMIC is compatible with Si fabrication processes, and its application is not limited to single-level processes.
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Jeon et al. (1998) studied this question.