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Step coverage of magnetron sputtered SiO2 films prepared in 30% hydrogen-70% argon mixed gases has been investigated in comparison with that in argon only. The following results were obtained. (1) In pure argon, the step coverage profile has a vertical slope with microcrack at the step. (2) By mixing hydrogen in argon, step coverage is improved to a positive slope profile without microcracks, and the film at the step is densified.
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Tadashi Serikawa (1980) studied this question.
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