plasma with low energy were then used to polish the grating to acquire low surface roughness and groove profiles closer to the ideal profiles. The morphologies of the gratings were characterized by AFM. The efficiencies and stray light were measured quantitatively by self-developed equipment. These results show that the ICP etching-polishing method is a promising candidate for production of good quality gratings into common optical materials.
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Jiao et al. (2016) studied this question.
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