Step Coverage Characteristics of Pb(Zr, Ti)O3 Thin Films on Various Electrode Materials by Metalorganic Chemical Vapor Deposition

The step coverage characteristics of Pb(Zr, Ti)O3 (PZT) thin films on steps with various electrode materials, such as Pt/SiO2, Ir/SiO2 and IrO2/SiO2, by metalorganic chemical vapor deposition (MOCVD) were investigated. The step coverage of PZT films deposited on Pt/SiO2 at 500 and 550° C was 80–87%. Deformation of Pt/SiO2 steps was observed when PZT films were deposited at 600° C. The cause of this deformation of steps was mainly the diffusion of Pb into the steps. When PZT thin films were deposited on Ir/SiO2 at 500–600° C and IrO2/SiO2 at 500 and 550° C, good step coverage of 76–93% and 70–85% was obtained, respectively.