NiFeP films were electrodeposited based on the FeP film in order to decrease their saturation magnetostriction (λs) and increase their resistivity (ρ). Ni11Fe65P24 films with low λs (= 8.2 × 10-6) were obtained, because they contained 11 at%Ni. The films have suitable soft magnetic properties and thermal stability after annealing at under 250°C in vacuum. In order to increase the resistivity of Ni11Fe65P24 film, an organic additive such as diethylenetriamine (DET) was added to the plating bath. A new type of soft magnetic NiFeP film with a higher resistivity of 170μΩcm was developed from a bath containing DET, because of the 0.2 at% carbon content of the deposited film.
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Takai et al. (1998) studied this question.
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