Quantitative surface chemical‐state microscopy by x‐ray photoelectron spectroscopy

The realization of surface chemical‐state microscopy by x‐ray photoelectron spectroscopy requires the resolution of overlapped chemical states, an adequate background description and the ability to quantify data. This can be achieved only by the acquisition and analysis of multi spectral data sets. Here we describe the software to perform this analysis, which is capable of allowing for small amounts of differential charging and for incorporation of knowledge about the sample. We demonstrate its use on a patterned silicon dioxide on silicon sample, and suggest ways to reduce oversampling and therefore acquisition times.