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September 15, 2011Optics ExpressOpen Access

Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates

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Authors

GOGo ObaraNMNaoki MaedaChugai Pharma (United States)TMTomoya MiyanishiAcquisition, Technology & Logistics Agency

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Obara et al. (2011) studied this question.

synapsesocial.com/papers/6a99c6aa3f53f1c2edb4e7ebhttps://doi.org/10.1364/oe.19.019093
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