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Recent progress in source development for lithography at 6.x nm, O'Sullivan, Gerry, Cummins, Thomas, Dunne, Padraig, Endo, Akira, Hayden, Paddy, Higashiguchi, Takeshi, Kilbane, Deirdre, Li, Bowen, O'Gorman, Colm, Otsuka, Takamitsu, Sokell, Emma, Yugami, Noboru
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O’Sullivan et al. (2013) studied this question.
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