Comparison of Si surface roughness measured by atomic force microscopy and ellipsometry

This is the authors' abstract. We don't add key points for this paper.

Measurements of Si surface roughness by atomic force microscopy and ellipsometry have been performed over a wide range of conditions. Advanced methods of data analysis have been applied to both techniques leading to a quantitative comparison of root-mean-square (rms) roughness to the ellipsometric paramter Δ. Differences in Δ are observed for surfaces with the same rms roughness, but different roughness spectral densities, as expected from theory.