Complementary Germanium Electron–Hole Bilayer Tunnel FET for Sub-0.5-V Operation

In this letter, we present a novel device, the germanium electron-hole (EH) bilayer tunnel field-effect transistor, which exploits carrier tunneling through a bias-induced EH bilayer. The proposed architecture provides a quasi-ideal alignment between the tunneling path and the electric field controlled by the gate. The device principle and performances are studied by 2-D numerical simulations. This device allows interesting features in terms of low operating voltage (AVG~ 13 mV/dec over six decades of current), ION/IOFFratio of ~ 109, and drive current of ION~ 10 μA/μm at VDD= 0.5 V. The same structure with symmetric voltages can be used to achieve a p-type device with IONand IOFFlevels comparable to the n-type, which enables a straightforward implementation of complementary logic that could theoretically reach a maximum operating frequency of 1.39 GHz when VDD= 0.25 V.