Generation of an anomalous hole trap in GaAs by As overpressure annealing

Deep levels in high-purity n-type molecular beam epitaxy (MBE) GaAs and in undoped n-type metalorganic chemical vapor deposition (MOCVD) GaAs samples annealed with various As overpressures were investigated using constant capacitance deep level transient spectroscopy on evaporated Au Schottky barrier diodes. Anomalous hole traps, which could be measured because of a surface effect, were observed in all annealed samples. EL2 traps were created in the MBE material by the annealing, while the concentration of EL2 in the annealed MOCVD material was about the same as that before annealing. The effect of annealing on the other electron traps in these samples is also studied and reported.