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A new simple method of measuring diffusion range of acid in chemical amplification resist has been designed. With this method, PEB temperature and PEB time dependence of diffusion range were investigated, and apparent activation energy of diffusion was estimated. Comparing this and activation energy of decomposition of inhibitor, decomposition was revealed to be rate-determining reaction during PEB. This is thought to be the reason for PEB dependence on the pattern profile of the resist.
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Koji Asakawa (1993) studied this question.
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