Multilayer thin films of metallic nanoclusters, polymers and other molecules have been formed using a novel electrostatic self-assembly method and analysed by multiple characterization techniques. Nanocluster size measurements, ellipsometry and UV-visible absorption spectroscopy have been used to confirm the linear build-up of the thin film thickness with the number of deposited nanocluster, polymer and other molecular layers. Auger electron spectroscopy allowed verification of the distribution of molecular species through thick films with multilayer segments containing different elements. Field emission scanning electron microscopy and atomic force microscopy permitted visualization of the morphologies of the outermost layers of the deposited films. Together, such characterization allows improved understanding and the basis for the design of multilayer thin film materials engineered to have specific molecular level structures and macroscopic functionalities.
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Liu et al. (1999) studied this question.
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