Positive- and negative-type metal photomasks are fabricated by dip-pen nanolithography (see picture). Positive-type photomasks are generated with a multiple-pen array at a rate rivaling electron-beam lithography. For the negative-type photomasks, a poly(ethylene glycol) ink is used as the resist and lift-off material.
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Jang et al. (2009) studied this question.
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