Electrodeposited semiconducting molybdenum selenide films. I. Preparatory technique and structural characterisation

Molybdenum selenide films have been electrodeposited cathodically on titanium substrates from an ammoniacal solution of H 2 MoO 4 and SeO 2 under galvanostatic conditions. The initial layers of the film were of Se followed by an increasing amount of Mo in the deposit. Some intermediate layer has a composition equivalent to molybdenum selenide (MoSe 2 ). An 'induced codeposition' mechanism for the MoSe 2 film deposition has been suggested. Structural characterisation of the electrodeposited films using EDAX, EM and SEM studies has been carried out.