Sub‐100 nm, Centimeter‐Scale, Parallel Dip‐Pen Nanolithography

Atomic force microscope (AFM) cantilever linear arrays are used for parallel dip-pen nanolithography (DPN). Three different tip configurations are studied, all of which involve only a single feedback system in a conventional AFM instrument or an Nscriptor, a dedicated instrument designed for DPN. A simple and convenient tip–substrate alignment procedure provides centimeter-scale, sub-100 nm resolution patterning (see micrograph image).