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The phenomenon of x-ray interference upon reflection from thin films is well known. Superposed on this interference a second interference phenomenon has been found which manifests itself as structure in the scattered radiation accompanying the specularly reflected x-ray beam. This new phenomenon is attributed to an interference between the components of scattered radiation originating at the two surfaces of the film. This interference structure in the scattered radiation has been analyzed and used to determine the thickness of vacuum deposited copper films ranging in thickness from 250 to 1000 {}. The results were consistent with those obtained by previously described techniques.
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Sauro et al. (1963) studied this question.
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