The sheath thickness in plasma immersion ion implantation has been investigated in the presence of a transverse magnetic field. It has been found that the steady-state sheath thickness increases with increasing magnetic field strength. This result is in line with a simplified model of the sheath in which the steady-state sheath thickness is determined by the plasma density and ion velocity at the sheath edge. These results suggest that a magnetic field may be used to control the high-voltage sheath in plasma immersion ion implantation.
No takes yet. Share an insight, caveat, or question.
Keidar et al. (2002) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: