Large-scale fabrication of ordered arrays of carbon nanotubes (CNTs) on silicon substrate has been accomplished using a technique that combines the advantages of the electron-beam lithography (EBL) and template methods. The monodisperse diameters of the fabricated CNTs can be adjusted from about 5 to 100 nm. Using the proposed method, ordered arrays of highly graphitized CNTs can be fabricated economically on most flat and smooth substrates.
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Lei et al. (2004) studied this question.
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