Scaling behavior of deposition models with limited downward mobility

We have studied the interface-width scaling behavior of deposition models in which limited downward mobility is introduced. In all the models studied here, there is a maximum allowed slope for the interface at which the growth velocity is zero. The Kardar-Parisi-Zhang equation is resummed in order to show explicitly this slope constraint, but still incorporates parameters {λ} measuring the slope dependence of the growth velocity, {ν} measuring the surface tension, and D measuring the noise amplitude. Increasing mobility naturally smooths the interface, and is associated with a decrease in the magnitude of λeff={λ}D1/2/ν3/2. A detailed study of a bridge-site deposition model, with one hop of probability p, shows that {}{λ}{} increases with p. From an independent assessment of noise-amplitude behavior, we can conclude that {ν} must also increase with p to ensure the required λeff behavior. Direct determination of {ν} via the Wolf-Tang procedure of imposing inhomogeneity on some length scale L supports this conclusion. (However {ν} depends on the inhomogeneity strength, which should be chosen small, and on L.) We comment on anticipated behavior of similar limited-mobility models in d{≥}2 dimensions, and compare with behavior of limited-mobility ballistic deposition and noise-reduced deposition models.