An ion projection lithography machine uses ions as the information carrier in a demagnifying step-and-repeat exposure system. With an IPLM sub-0.2-micron resolution can be obtained combined with an extremely high depth of focus—more than 100 μm. The use of a reliable and stable duoplasmatron ion source with high brightness and high angular current density is significant for this machine. A preprojective lens octupole permits an electrostatic shift of the ion image in x and y directions, and a solenoid at this site enables a rotation of the ion image through the action of the axial magnetic field. Furthermore, the scale of the projected ion image can be adjusted electronically within ±3%. Thus fine adjustment for die-by-die alignment can be done without mechanical movements. An ion projection lithography machine IPLM-01 with a total height of 2.5 m and a floor space of 2 m2 has been built. By inserting a mask consisting of a grid of pinholes an ion multibeam scanning tool (IMBS) is generated. Using demagnifying projection an IMBS enables the production of gratings with sub-0.2-μm periodicity and adjusted scale.
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Stengl et al. (1986) studied this question.