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Mg and Nb-doped Mg films were deposited by rf magnetron sputtering. Morphological and structural analysis were performed by scanning electron microscopy and x-ray diffraction. The desorption kinetics has been investigated by using a Sievert-type apparatus. The overall activation energy and the reaction order controlling desorption are (141±5)kJmol−1H and n≈4 for Mg and (51±5)kJmol−1H and n≈1 for Nb-doped (5at.%) Mg. It is suggested that Nb atoms dispersed in the MgH2 grains catalyzes the dissociation of the hydride phase and that the rate limiting step in the H2 desorption is given by the H atomic migration through interconnected transformed domains of h-Mg.
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Bazzanella et al. (2004) studied this question.
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