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The adherence of certain commercial photoresists with thermal was found to depend on the surface constitution of the . Thermal surfaces were modified to contain: ( i ) adsorbed molecular water, ( ii ) appreciable concentration of silanol groups, or ( iii ) predominantly siloxane structure. The adherence of Kodak photoresists KPR‐2, KTFR, and KMER with each of these surface types was evaluated.
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R. O. Lussow (1968) studied this question.
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