Out of the shadow: DNA shadow nanolithography utilizes the patterning ability of DNA without requiring the nucleic acid to remain in the final construct. DNA patterns are formed on Si surfaces and metal deposition and anisotropic etching are utilized to make DNA-templated trench features in substrates with <30-nm line widths (see scheme). These trenches can be post-processed using standard microfabrication tools to form distinct nanostructures, such as nanochannels and nanowires.
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Becerril et al. (2007) studied this question.
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