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By atomic force microscopy (AFM), we have realized nanolithography and changed the physical properties within a desired nanosized region on Nb-doped SrTiO3 single-crystal substrate. Importantly, a considerable relaxation of these written patterns was observed directly, which evidently indicates that a significant chemical transport occurs during and after the AFM lithography. Furthermore, we found that defects introduced by Ar bombardment can stabilize these patterns, which is quite effective for the application of AFM lithography in perovskite oxides.
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Li et al. (2004) studied this question.
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