Well‐Aligned Nanocylinder Formation in Phase‐Separated Metal‐Silicide–Silicon and Metal‐Germanide–Germanium Systems

Well-aligned nanocylinder formation (see figure) is carried out by using conventional sputtering deposition. Various metal-silicide–silicon and metal-germanide–germanium systems exhibit uniform phase separation with ordered cylinder arrays in a matrix with periodic spacing from 1.9 to 20.2 nm. There is a correlation between the periodic spacing of the cylinders and the eutectic temperatures in these systems.