Silicon implants for double bonds: An unusual tetrasilymethane derivative, the 2-phospha-1,3-disiletane 2 is formed through the spontaneous consecutive addition of two equivalents of SiCl2 to the phosphaalkene 1. Simultaneously the diphosphene 3 is also formed, which contains a central PP bond and silylphosphane groups.
No takes yet. Share an insight, caveat, or question.
Μοnt et al. (2002) studied this question.
Synapse has enriched 5 related papers. Consider them for comparative context:
More from Angewandte Chemie International Edition