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Multilayer metasurfaces (MLMs) represent a versatile type of three-dimensional optical metamaterials that could enable ultrathin and multifunctional photonic components. Herein, we demonstrate an approach to readily fabricate MLMs, exploiting a thin film self-rolling technique. As opposed to standard layer-by-layer approaches, all the metasurfaces are defined within a single nanopatterning step, significantly reducing fabrication time and costs. We realize two MLM platforms relying on widely used nanopatterning techniques, namely, focused ion-beam and electron-beam lithographies. A first example are MLMs comprised of nanohole patterns structured into metal–dielectric seed bilayers. The second platform is comprised of vertical stacks of angled plasmonic nanorod arrays separated by thin dielectric layers. Such angled MLMs exhibit a selective response to circularly polarized light, in agreement with previous works relying on layer-by-layer processes. Our approach can pave the way for the efficient prototyping of novel MLMs, such as devices with varying numbers of layers and configurations that can be fabricated on a single chip.
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