CdF2/CaF2 Resonant Tunneling Diode Fabricated on Si(111)

We propose use of a new material, CdF2, and a heterostructure composed of CdF2 and CaF2 for applications of Si-based quantum effect devices. The optimum growth temperature for each layer of a CaF2/CdF2/CaF2 heterostructure grown by molecular beam epitaxy on a Si(111) substrate was determined. Resonant tunneling diodes consisting of this heterostructure on Si were fabricated and negative differential resistance whose P/V current ratio was 24 at maximum was detected at room temperature.