Nucleation and Resistivity of Ultrathin TiN Films Grown by High-Power Impulse Magnetron Sputtering

TiN films have been grown onSiO₂by reactive high-power impulse magnetron sputtering (HiPIMS) at temperatures of 22∘ C–600∘C. The film resistance is monitored in situ to determine the coalescence and continuity thicknesses that decrease with increasing growth temperature with a minimum of 0.38±0.05 nm and 1.7±0.2 nm, respectively, at 400∘C. We find that HiPIMS-deposited films have significantly lower resistivity than dc magnetron sputtered (dcMS) films onSiO₂at all growth temperatures due to reduced grain boundary scattering. Thus, ultrathin continuous TiN films with superior electrical characteristics can be obtained with HiPIMS at reduced temperatures compared to dcMS.