Answers are grounded in this paper and cite their sources.
Electron-beam lithography is used to pattern either cationic polyvinyl N-methyl pyridine or anionic sulfonated polystyrene polymers, that act as negative resists, to produce templates for electroless deposition and the electrostatic assembly of metallic, magnetic, or semiconductor nanoparticles.
No takes yet. Share an insight, caveat, or question.
Ofir et al. (2008) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: