We report the growth of (001)‐ and (111)‐oriented (Ba,Sr)TiO 3 (BST) films on Pt/TiO x /SiO 2 /Si substrates by RF magnetron sputtering without buffer layers. Interestingly, it was observed that the crystallographic orientation of prepared films strongly depended on O 2 /(Ar+O 2 ) mixed ratios (OMR) during deposition. The samples with OMR=0% showed a perfect (001) orientation, while those with OMR ranging from 10% to 50% showed a preferential (111) orientation. The perfectly (111)‐oriented BST film deposited with OMR=30% exhibited a broader grain size distribution than the (001) textured BST film. At ±400 kV/cm, high tunability of 52% and 68% can be achieved for (001)‐ and (111)‐oriented BST films, respectively.
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Yang et al. (2009) studied this question.
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